Thermal-optical switching of a silicon based interference filter.
Autor: | Augustine, B. H., Feng, S. T., Irene, E. A., Ray, M. A. |
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Zdroj: | Journal of Applied Physics; 2/15/1994, Vol. 75 Issue 4, p1875, 4p |
Abstrakt: | Presents a study that investigated thermal-optical switching. Use of a silicon based interference filter fabricated by plasma enhanced chemical vapor deposition; Demonstration of atomic layer thickness precision; Suggestions for improving device performance. |
Databáze: | Complementary Index |
Externí odkaz: |