High-performance diffusion disordered AlxGa1-xAs lasers via a self-aligned process and conventional open-tube annealing.

Autor: Burton, R. S., Schlesinger, T. E., Holmgren, D. J., Smith, S. C., Burnham, R. D.
Předmět:
Zdroj: Journal of Applied Physics; 2/15/1993, Vol. 73 Issue 4, p2015, 4p, 1 Diagram, 2 Graphs
Abstrakt: Deals with high-performance diffusion disordered Al[subx]Ga[sub1-x]As lasers via a self-aligned process and conventional open-tube annealing. Details of the experimental techniques used; Discussion on silicon-oxygen diffusion observations.
Databáze: Complementary Index