Ga0.5In0.5P/GaAs interfaces by organometallic vapor-phase epitaxy.

Autor: Bour, D. P., Shealy, J. R., McKernan, S.
Předmět:
Zdroj: Journal of Applied Physics; 2/15/1988, Vol. 63 Issue 4, p1241, 3p, 1 Chart, 3 Graphs
Abstrakt: Focuses on the formulation of the gallium [sub0.5]indium[sub0.5]phosphorous/gallium arsenide interface during low pressure organometallic vapor phase epitaxial growth. Information on the interface; Procedures for epitaxial growth; Influence of Raman scattering on interface decomposition; Effect of growth stop on intermixing into gallium arsenide layers.
Databáze: Complementary Index