| Autor: |
Wu, S. L., Lee, C. L., Lei, T. F., Liang, M. S. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 8/15/1992, Vol. 72 Issue 4, p1378, 8p, 2 Black and White Photographs, 8 Graphs |
| Abstrakt: |
Presents a study that observed the high-performance ultrahin oxide prepared by a low-temperature wafer loading and nitrogen preannealing before oxidation. Experimental procedures; Structural morphology and oxide thickness of conventionally thermal oxidation and special oxidation samples; Conclusion. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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