An inorganic anti-reflective coating for use in photolithography.

Autor: Tompkins, Harland G., Sellers, James A., Tracy, Clarence
Předmět:
Zdroj: Journal of Applied Physics; 4/15/1993, Vol. 73 Issue 8, p3932, 7p, 3 Black and White Photographs, 1 Diagram, 7 Graphs
Abstrakt: Describes the optical consideration of interest and one method of fabricating a superior anti-reflective coating (ARC) through the partial oxidation of a thin TiW capping layer. Importance of ARC on photolithography; Fabrication of the film; Wavelength used for thickness measurements of the film.
Databáze: Complementary Index