Characterization of GaAs self-aligned refractory-gate metal-semiconductor field-effect transistor (MESFET) integrated circuits.

Autor: Magerlein, J. H., Webb, D. J., Callegari, A., Feder, J. D., Fryxell, T., Guthrie, H. C., Hoh, Peter D., Mitchell, J. W., Pomerene, A. T. S., Scontras, S., Spiers, Guy D., Greiner, J. H.
Předmět:
Zdroj: Journal of Applied Physics; 4/15/1987, Vol. 61 Issue 8, p3080, 13p, 5 Diagrams, 1 Chart, 20 Graphs
Abstrakt: Focuses on a study that characterized gallium arsenide metal-semiconductor field effect transistors and other integrated-circuit elements by including extensive process test sites on wafers with digital logic and memory circuits. Overview of vertical structure; Process characterization test results Summary.
Databáze: Complementary Index