Autor: |
Wang, Q. H., Bowser, M. I., Swanson, J. G. |
Předmět: |
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Zdroj: |
Journal of Applied Physics; 10/1/1994, Vol. 76 Issue 7, p4209, 6p, 2 Diagrams, 7 Graphs |
Abstrakt: |
Focuses on a study which examined the thermal emission of charges in Si[sub3]N[sub4] structures, which were prepared using direct plasma-enhanced chemical-vapor deposition. Temperature range when channel current transient spectroscopy was used; Processes observed when argon and hydrogen were used together; Implication of the necessity for argon and hydrogen. |
Databáze: |
Complementary Index |
Externí odkaz: |
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