Oxidation resistance of TaSiN diffusion barriers.
| Autor: | Letendu, F., Hugon, M. C., Desvignes, J. M., Agius, B., Vickridge, I, Kim, D. J., Kingon, A. I. |
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| Zdroj: | Integrated Ferroelectrics; Nov2000, Vol. 31 Issue 1-4, p315-322, 8p |
| Databáze: | Complementary Index |
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