Electrical properties of Y1-based ferroelectric gate MOS capacitors for nonvolatile memory applications.
Autor: | Arita, K., Otsuki, T., Chen, Z., Lim, M., Bacon, J. W., Paz De Araujo, C. A. |
---|---|
Zdroj: | Integrated Ferroelectrics; Nov1999, Vol. 27 Issue 1-4, p19-29, 11p |
Databáze: | Complementary Index |
Externí odkaz: |