The Application of Phosphazene Containing Polymers as Negative Resists in Microlithography.
| Autor: | Puyenbroek, Robert, Bosscher, Gerard, Van De Grampel, Johan C., Rousseeuw, Bernard A. C., Van Der Drift, Emile W. J. M. |
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| Zdroj: | Phosphorus, Sulfur & Silicon & the Related Elements; Aug1994, Vol. 93 Issue 1-4, p277-280, 4p |
| Databáze: | Complementary Index |
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