| Autor: |
Borisov, V. M., Vinokhodov, A. Yu., Ivanov, A. S., Kiryukhin, Yu. B., Mironov, S. V., Mishchenko, V. A., Prokof’ev, A. V., Khristoforov, O. B. |
| Předmět: |
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| Zdroj: |
Plasma Physics Reports; Oct2002, Vol. 28 Issue 10, p877, 5p |
| Abstrakt: |
The results from studies aimed at creating a high-power high-repetition-rate gas-discharge EUV source based on xenon Z-pinch are presented. In a liquid-cooled EUV source prototype, an average output power of 10 W for the burst mode (∼1 s) and 5 W for continuous operation, emitted into a solid angle of 0.25 sr and 2% bandwidth around 13.5 nm is attained at a repetition rate of ∼1 kHz. Operating wavelength of the source corresponds to XeXI 13.5-nm ion emission band. It is experimentally shown that the size of the emitting hot plasma can be decreased to ∼2 mm without loss in the average output power. The radiation characteristics were determined by using standard techniques and calibrated metrology tools, which allowed a comparison of the absolute values of the measured parameters with the available data on other EUV sources developed for the next-generation lithography with a resolution of ∼50 nm. The attained level of an average EUV power of 10 W at λ = 13.5 nm into the 0.25-sr solid angle and 2% bandwidth is one of the highest at the moment. © 2002 MAIK “Nauka / Interperiodica”. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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