Initial reactions and silicide formation of titanium on silicon studied by Raman spectroscopy.
| Autor: | Nemanich, R. J., Fulks, R. T., Stafford, B. L., Vander Plas, H. A. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1985, Vol. 3 Issue 3, p938-941, 4p |
| Databáze: | Complementary Index |
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