Electron-beam double resist process to enhance bright field pattern resolution.
| Autor: | Chan, Victor W. C., Chan, Philip C. H. |
|---|---|
| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2002, Vol. 20 Issue 3, p849-854, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|