Step and flash imprint lithography: Defect analysis.
| Autor: | Bailey, T., Smith, B., Choi, B. J., Colburn, M., Meissl, M., Sreenivasan, S. V., Ekerdt, J. G., Willson, C. G. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2001, Vol. 19 Issue 6, p2806-2810, 5p |
| Databáze: | Complementary Index |
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