Process characterization for tapered contact etch.

Autor: Celii, F. G., He, Q., Liu, H.-Y., DeBord, J. R., Sakima, H.
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2001, Vol. 19 Issue 5, p1845-1851, 7p
Databáze: Complementary Index