Process characterization for tapered contact etch.
Autor: | Celii, F. G., He, Q., Liu, H.-Y., DeBord, J. R., Sakima, H. |
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Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2001, Vol. 19 Issue 5, p1845-1851, 7p |
Databáze: | Complementary Index |
Externí odkaz: |