Ion energy distributions and optical emission spectra in NF3-based process chamber cleaning plasmas.
| Autor: | Hsueh, Hsin-Pai, McGrath, Robert T., Ji, Bing, Felker, Brian S., Langan, John G., Karwacki, Eugene J. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2001, Vol. 19 Issue 4, p1346-1357, 12p |
| Databáze: | Complementary Index |
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