Ion channeling effects on the focused ion beam milling of Cu.

Autor: Kempshall, B. W., Schwarz, S. M., Prenitzer, B. I., Giannuzzi, L. A., Irwin, R. B., Stevie, F. A.
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2001, Vol. 19 Issue 3, p749-754, 6p
Databáze: Complementary Index