Evaluation of a 100 kV thermal field emission electron-beam nanolithography system.
| Autor: | Tennant, D. M., Fullowan, R., Takemura, H., Isobe, M., Nakagawa, Y. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2000, Vol. 18 Issue 6, p3089-3094, 6p |
| Databáze: | Complementary Index |
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