Resolution of the multiple aperture pixel by pixel enhancement of resolution electron lithography concept.

Autor:	Kampherbeek, B. J., Wieland, M. J., Kruit, P.
Zdroj:	Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2000, Vol. 18 Issue 1, p117-121, 5p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu