Comparison of contact radius models for ultrashallow spreading resistance profiles.

Autor: Hartford, E. J., Ramey, S. M., Ye, C. W., Hartford, C. L.
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2000, Vol. 18 Issue 1, p401-404, 4p
Databáze: Complementary Index