Comparison of contact radius models for ultrashallow spreading resistance profiles.
Autor: | Hartford, E. J., Ramey, S. M., Ye, C. W., Hartford, C. L. |
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Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2000, Vol. 18 Issue 1, p401-404, 4p |
Databáze: | Complementary Index |
Externí odkaz: |