Projection reduction exposure with variable axis immersion lenses: Next generation lithography.
| Autor: | Pfeiffer, H. C., Dhaliwal, R. S., Golladay, S. D., Doran, S. K., Gordon, M. S., Groves, T. R., Kendall, R. A., Lieberman, J. E., Petric, P. F., Pinckney, D. J., Quickle, R. J., Robinson, C. F., Rockrohr, J. D., Senesi, J. J., Stickel, W., Tressler, E. V., Tanimoto, A., Yamaguchi, T., Okamoto, K., Suzuki, K. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1999, Vol. 17 Issue 6, p2840-2846, 7p |
| Databáze: | Complementary Index |
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