Contrast limitations in electron-beam lithography.
| Autor: | Crandall, Richard, Hofmann, Uli, Lozes, Richard L. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1999, Vol. 17 Issue 6, p2945-2947, 3p |
| Databáze: | Complementary Index |
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