Investigating the process latitude of a low temperature metalorganic chemical vapor deposition TiNitride process.
| Autor: | Bulger, J. M., Whelan, C. S., Dumont, Andrew, Kuhn, Markus, Clark, Joseph |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1999, Vol. 17 Issue 2, p410-415, 6p |
| Databáze: | Complementary Index |
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