Masked ion beam lithography with highly charged ions.
| Autor: | Gillaspy, J. D., Parks, D. C., Ratliff, L. P. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1998, Vol. 16 Issue 6, p3294-3297, 4p |
| Databáze: | Complementary Index |
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