Negative electron-beam nanofabrication resist using acid-catalyzed protection of polyphenol provided by phenylcarbinol.
| Autor: | Uchino, Shou-ichi, Yamamoto, Jiro, Migitaka, Sonoko, Kojima, Kyoko, Hashimoto, Michiaki, Shiraishi, Hiroshi |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1998, Vol. 16 Issue 6, p3684-3688, 5p |
| Databáze: | Complementary Index |
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