Chemically amplified resist processing with top coats for deep-ultraviolet and e-beam applications.
| Autor: | Petrillo, Karen, Bucchignano, James, Angelopoulos, Marie, Cornett, Kathleen, Brunsvold, William |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1998, Vol. 16 Issue 6, p3709-3715, 7p |
| Databáze: | Complementary Index |
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