193 nm single layer resist strategies, concepts, and recent results.
| Autor: | Nalamasu, O., Houlihan, F. M., Cirelli, R. A., Timko, A. G., Watson, G. P., Hutton, R. S., Kometani, J. M., Reichmanis, E., Gabor, A., Medina, A., Slater, S. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1998, Vol. 16 Issue 6, p3716-3721, 6p |
| Databáze: | Complementary Index |
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