Photoresist erosion studied in an inductively coupled plasma reactor employing CHF3.
| Autor: | Doemling, M. F., Rueger, N. R., Oehrlein, G. S., Cook, J. M. |
|---|---|
| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1998, Vol. 16 Issue 4, p1998-2005, 8p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|