Use of attenuated phase masks in extreme ultraviolet lithography.
| Autor: | Wood, O. R., White, D. L., Bjorkholm, J. E., Fetter, L. E., Tennant, D. M., MacDowell, A. A., LaFontaine, B., Kubiak, G. D. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1997, Vol. 15 Issue 6, p2448-2451, 4p |
| Databáze: | Complementary Index |
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