Overlay performance of 180 nm ground rule generation x-ray lithography aligner.
| Autor: | Chen, A. C., Flamholz, A. L., Rippstein, R., Fair, R. H., Heald, D. A., Amodeo, R. J. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1997, Vol. 15 Issue 6, p2476-2482, 7p |
| Databáze: | Complementary Index |
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