Resist design concepts for 193 nm lithography: Opportunities for innovation and invention.

Autor: Reichmanis, E., Nalamasu, O., Houlihan, F. M., Wallow, T. I., Timko, A. G., Cirelli, R., Dabbagh, G., Hutton, R. S., Novembre, A. E., Smith, B. W.
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1997, Vol. 15 Issue 6, p2528-2533, 6p
Databáze: Complementary Index