Resist design concepts for 193 nm lithography: Opportunities for innovation and invention.
Autor: | Reichmanis, E., Nalamasu, O., Houlihan, F. M., Wallow, T. I., Timko, A. G., Cirelli, R., Dabbagh, G., Hutton, R. S., Novembre, A. E., Smith, B. W. |
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Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1997, Vol. 15 Issue 6, p2528-2533, 6p |
Databáze: | Complementary Index |
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