Etch-mask of pyrolytic-photoresist thin-film for self-aligned fabrication of smooth and deep faceted three-dimensional microstructures.
| Autor: | Porkolab, G. A., Hsu, Shih-Hsiang, Hryniewicz, John V., Lin, Wenhua, Chen, Y. J., Agarwala, Sambhu, Johnson, F. G., King, Oliver, Dagenais, M., Stone, D. R. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1996, Vol. 14 Issue 6, p3650-3653, 4p |
| Databáze: | Complementary Index |
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