Attenuated phase shift mask materials for 248 and 193 nm lithography.
| Autor: | Smith, B. W., Butt, S., Alam, Z., Kurinec, S., Lane, R. L. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1996, Vol. 14 Issue 6, p3719-3723, 5p |
| Databáze: | Complementary Index |
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