Wet silylation and oxygen plasma development of photoresists: A mature and versatile lithographic process for microelectronics and microfabrication.
| Autor: | Gogolides, Evangelos, Tzevelekis, Dimitrios, Grigoropoulos, Spyridon, Tegou, Evangelia, Hatzakis, Michael |
|---|---|
| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1996, Vol. 14 Issue 5, p3332-3338, 7p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|