Calculation of etching profile in the photolithographic process on As2S3 thin films.
Autor: | Mamedov, S., Kisliuk, A. |
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Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1996, Vol. 14 Issue 3, p1864-1866, 3p |
Databáze: | Complementary Index |
Externí odkaz: |