Three-dimensional design in electron-beam lithography.
| Autor: | Aristov, V. V., Dubonos, S. V., Dyachenko, R. Ya., Gaifullin, B. N., Matveev, V. N., Raith, H., Svintsov, A. A., Zaitsev, S. I. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1995, Vol. 13 Issue 6, p2526-2528, 3p |
| Databáze: | Complementary Index |
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