Sub-10 nm lithography and development properties of inorganic resist by scanning electron beams.
| Autor: | Fujita, J., Watanabe, H., Ochiai, Y., Manako, S., Tsai, J. S., Matsui, S. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1995, Vol. 13 Issue 6, p2757-2761, 5p |
| Databáze: | Complementary Index |
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