Reaction modeling of chemically amplified resists for ArF excimer laser lithography.
| Autor: | Ohfuji, T., Nakano, K., Maeda, K., Hasegawa, E. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1995, Vol. 13 Issue 6, p3022-3025, 4p |
| Databáze: | Complementary Index |
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