Optimization of reactive ion etching of Al0.48In0.52As in CH4/H2 by the experimental design method.
| Autor: | Carpi, Enio L., Van Hove, M., Alay, J. L., Van Rossum, M. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1995, Vol. 13 Issue 3, p895-901, 7p |
| Databáze: | Complementary Index |
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