Grain growth in copper films exposed to magnetically enhanced plasmas.

Autor: Naeem, Munir D., Rossnagel, Stephen M., Rajan, Krishna
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1995, Vol. 13 Issue 2, p209-213, 5p
Databáze: Complementary Index