Grain growth in copper films exposed to magnetically enhanced plasmas.
Autor: | Naeem, Munir D., Rossnagel, Stephen M., Rajan, Krishna |
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Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1995, Vol. 13 Issue 2, p209-213, 5p |
Databáze: | Complementary Index |
Externí odkaz: |