Nanometer-scale dimensional metrology for advanced lithography.
| Autor: | Marchman, H. M., Griffith, J. E., Guo, J. Z. Y., Frackoviak, J., Celler, G. K. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1994, Vol. 12 Issue 6, p3585-3590, 6p |
| Databáze: | Complementary Index |
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