Characterization of an expanded-field Schwarzschild objective for extreme ultraviolet lithography.

Autor:	Kubiak, G. D., Tichenor, D. A., Ray-Chaudhuri, A. K., Malinowski, M. E., Stulen, R. H., Haney, S. J., Berger, K. W., Nissen, R. P., Wilkerson, G. A., Paul, P. H., Bjorkholm, J. E., Fetter, L. A., Freeman, R. R., Himel, M. D., MacDowell, A. A., Tennant, D. M., Wood, O. R., Waskiewicz, W. K., White, D. L., Windt, D. L.
Zdroj:	Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1994, Vol. 12 Issue 6, p3820-3825, 6p
Databáze:	Complementary Index
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