Electron-beam lithography for the fabrication of air-bridged, submicron Schottky collectors.

Autor: Muller, R. E., Martin, S. C., Smith, R. P., Allen, S. A., Reddy, M., Bhattacharya, U., Rodwell, M. J. W.
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1994, Vol. 12 Issue 6, p3668-3672, 5p
Databáze: Complementary Index