Survey of high-voltage pulse technology suitable for large-scale plasma source ion implantation processes.
| Autor: | Reass, William A. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1994, Vol. 12 Issue 2, p854-860, 7p |
| Databáze: | Complementary Index |
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