Accurate profiling of ultra-shallow implants with mercury gate metal-oxide-semiconductor capacitance-voltage.
| Autor: | Dudal, Roger Le, Hillard, R. J., Heddleson, J. M., Weinzierl, S. R., Rai-Choudhury, P., Mazur, R. G. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1994, Vol. 12 Issue 1, p336-341, 6p |
| Databáze: | Complementary Index |
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