Multilayer resist dry etching technology for deep submicron lithography.
| Autor: | Tokashiki, Ken, Sato, Kiyoyuki, Aoto, Nahomi, Ikawa, Eiji |
|---|---|
| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1993, Vol. 11 Issue 6, p2284-2287, 4p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|