Laboratory setup for projection electron lithography and a Monte Carlo simulation of scattering mask transmission.
| Autor: | Miller, Peter D., Gibson, J. Murray, Bleeker, Arno J., Liddle, J. Alex |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1993, Vol. 11 Issue 6, p2352-2356, 5p |
| Databáze: | Complementary Index |
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