Determination of acid diffusion rate in a chemically amplified resist with scanning tunneling microscope lithography.
| Autor: | Perkins, F. Keith, Dobisz, Elizabeth A., Marrian, Christie R. K. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1993, Vol. 11 Issue 6, p2597-2602, 6p |
| Databáze: | Complementary Index |
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