Marks for alignment and registration in projection electron lithography.

Autor:	Farrow, R. C., Liddle, J. A., Berger, S. D., Huggins, H. A., Kraus, J. S., Camarda, R. M., Tarascon, R. G., Jurgensen, C. W., Kola, R. R., Fetter, L.
Zdroj:	Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1993, Vol. 11 Issue 6, p2175-2178, 4p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu